Thermal characterization of commercially pure titanium for dental applications

Materials Research. 2007;10(3):241-246 DOI 10.1590/S1516-14392007000300004

 

Journal Homepage

Journal Title: Materials Research

ISSN: 1516-1439 (Print)

Publisher: Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol)

LCC Subject Category: Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials

Country of publisher: Brazil

Language of fulltext: English

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AUTHORS

Enori Gemelli
Alex Scariot
Nelson Heriberto Almeida Camargo

EDITORIAL INFORMATION

Peer review

Editorial Board

Instructions for authors

Time From Submission to Publication: 36 weeks

 

Abstract | Full Text

Thermal characterization of commercially pure titanium was carried out in dry air to investigate the oxidation kinetics, the oxide structures and their properties. Oxidation kinetics were performed by thermogravimetry in isothermal conditions between 300 and 750 °C for 48 hours and the oxide structures were studied by differential thermal analyses and X ray diffraction between room temperature and 1000 °C. The oxidation kinetic increases with temperature and is very fast in the initial period of oxidation, decreasing rapidly with time, especially up to 600 °C. Kinetic laws varied between the inverse logarithmic for the lower temperatures (300 and 400 °C) and the parabolic for the higher temperatures (650, 700 and 750 °C). Evidences from X ray diffraction and differential thermal analyses showed that crystallization of the passive oxide film, formed at room temperature, into anatase occurs at about 276 °C. The crystallized oxide structure is composed of anatase between 276 and 457 °C, anatase and rutile sublayers between 457 and 718 °C, and a pure layer of rutile after 718 °C. Rockwell-C adhesion tests reveled that the oxide films formed up to 600 °C have a good adhesion. Vickers indentations on the oxidized surfaces showed that the hardness of the oxide film, measured at 600 and 650 °C, is approximately 9500 MPa. At these temperatures the surface roughness varied between 0.90 and 1.30 mm.