Directed Self-Assembly of Block Copolymer for Bit Patterned Media with Areal Density of 1.5 Teradot/Inch2 and Beyond

Journal of Nanomaterials. 2013;2013 DOI 10.1155/2013/615896

 

Journal Homepage

Journal Title: Journal of Nanomaterials

ISSN: 1687-4110 (Print); 1687-4129 (Online)

Publisher: Hindawi Publishing Corporation

LCC Subject Category: Technology: Technology (General)

Country of publisher: Egypt

Language of fulltext: English

Full-text formats available: PDF, HTML, ePUB

 

AUTHORS

XiaoMin Yang (Media Research Center, Seagate Technology, 47010 Kato Road, Fremont, CA 94538, USA)
Shuaigang Xiao (Media Research Center, Seagate Technology, 47010 Kato Road, Fremont, CA 94538, USA)
Yautzong Hsu (Media Research Center, Seagate Technology, 47010 Kato Road, Fremont, CA 94538, USA)
Michael Feldbaum (Media Research Center, Seagate Technology, 47010 Kato Road, Fremont, CA 94538, USA)
Kim Lee (Media Research Center, Seagate Technology, 47010 Kato Road, Fremont, CA 94538, USA)
David Kuo (Media Research Center, Seagate Technology, 47010 Kato Road, Fremont, CA 94538, USA)

EDITORIAL INFORMATION

Blind peer review

Editorial Board

Instructions for authors

Time From Submission to Publication: 16 weeks

 

Abstract | Full Text

Directed self-assembly (DSA) of block copolymer (BCP) holds great promise for many applications in nanolithography, including the next generation magnetic recording. In this work, directed self-assembly of block copolymer technique has been combined with rotary stage electron beam mastering to fabricate a circular full track nanoimprint template for bit patterned media (BPM) fabrication. In order to meet specific requirements in pattern structure and format between the data and the servo zone in a servo-integrated template, three types of lithographically defined prepatterns, (1) two-dimensional chemical pre-pattern, (2) two-dimensional low-topographic pre-pattern, and (3) one-dimensional high-topographic pre-pattern, have been explored for DSA process with two types of commercially available BCP thin film materials: cylinder-forming poly(styrene-b-methyl methacrylate) (PS-b-PMMA) and sphere-forming poly(styrene-b-dimethylsiloxane) (PS-b-PDMS). All guided BCP patterns exhibit highly ordered hexagonal close-packed (hcp) structures with high pattern quality. Using these BCP patterns, two polarities of dots-array templates (hole-tone and pillar-tone) with integrated servo patterns have been fabricated on a fused silica substrate at a density greater than 1.0 Td/in2. Furthermore, the fabricated master template has been used for UV-cure nanoimprint lithography process development on 2.5 inch disk size media. Good pattern uniformity in imprint resist has been achieved over an entire 2.4 mm wide band area. The imprint resist patterns have been further transferred into underlying CoCrPt media by ion beam etching. Evidently, for the first time, the patterned CoCrPt alloy dots (hcp pattern) have successfully been demonstrated at a high density of  1.5 Td/in2 (pitch=22.3 nm) for a guided media (Hc≅7 kOe) and 3.2 Td/in2 (pitch=15.2 nm) for an unguided media (Hc≅5 kOe).