Suppressing the Effect of the Wetting Layer through AlAs Capping in InAs/GaAs QD Structures for Solar Cells Applications
Nazaret Ruiz,
Daniel Fernández,
Lazar Stanojević,
Teresa Ben,
Sara Flores,
Verónica Braza,
Alejandro Gallego Carro,
Esperanza Luna,
José María Ulloa,
David González
Affiliations
Nazaret Ruiz
University Research Institute on Electron Microscopy & Materials, (IMEYMAT), Universidad de Cádiz, 11510 Puerto Real, Spain
Daniel Fernández
University Research Institute on Electron Microscopy & Materials, (IMEYMAT), Universidad de Cádiz, 11510 Puerto Real, Spain
Lazar Stanojević
Institute for Systems Based on Optoelectronics and Microtechnology (ISOM), Universidad Politécnica de Madrid, Avda. Complutense 30, 28040 Madrid, Spain
Teresa Ben
University Research Institute on Electron Microscopy & Materials, (IMEYMAT), Universidad de Cádiz, 11510 Puerto Real, Spain
Sara Flores
University Research Institute on Electron Microscopy & Materials, (IMEYMAT), Universidad de Cádiz, 11510 Puerto Real, Spain
Verónica Braza
University Research Institute on Electron Microscopy & Materials, (IMEYMAT), Universidad de Cádiz, 11510 Puerto Real, Spain
Alejandro Gallego Carro
Institute for Systems Based on Optoelectronics and Microtechnology (ISOM), Universidad Politécnica de Madrid, Avda. Complutense 30, 28040 Madrid, Spain
Esperanza Luna
Paul-Drude-Institut für Festkörperelektronik, Leibniz-Institut im Forschungsverbund Berlin e.V., Hausvogteiplatz 5-7, D-10117 Berlin, Germany
José María Ulloa
Institute for Systems Based on Optoelectronics and Microtechnology (ISOM), Universidad Politécnica de Madrid, Avda. Complutense 30, 28040 Madrid, Spain
David González
University Research Institute on Electron Microscopy & Materials, (IMEYMAT), Universidad de Cádiz, 11510 Puerto Real, Spain
Recently, thin AlAs capping layers (CLs) on InAs quantum dot solar cells (QDSCs) have been shown to yield better photovoltaic efficiency compared to traditional QDSCs. Although it has been proposed that this improvement is due to the suppression of the capture of photogenerated carriers through the wetting layer (WL) states by a de-wetting process, the mechanisms that operate during this process are not clear. In this work, a structural analysis of the WL characteristics in the AlAs/InAs QD system with different CL-thickness has been made by scanning transmission electron microscopy techniques. First, an exponential decline of the amount of InAs in the WL with the CL thickness increase has been found, far from a complete elimination of the WL. Instead, this reduction is linked to a higher shield effect against QD decomposition. Second, there is no compositional separation between the WL and CL, but rather single layer with a variable content of InAlGaAs. Both effects, the high intermixing and WL reduction cause a drastic change in electronic levels, with the CL making up of 1–2 monolayers being the most effective configuration to reduce the radiative-recombination and minimize the potential barriers for carrier transport.