Atomic layer deposition of HfO2 on graphene from HfCl4 and H2O

• Alles Harry,
• Aarik Jaan,
• Aidla Aleks,
• Fay Aurelien,
• Kozlova Jekaterina,
• Niilisk Ahti,
• Pärs Martti,
• Rähn Mihkel,
• Wiesner Maciej,
• Hakonen Pertti,
• Sammelselg Väino

Affiliations

Alles Harry

Aarik Jaan

Institute of Physics, University of Tartu, Tartu, 51014, Estonia

Aidla Aleks

Institute of Physics, University of Tartu, Tartu, 51014, Estonia

Fay Aurelien

Low Temperature Laboratory, Aalto University, Espoo, P.O. Box 15100, Finland

Kozlova Jekaterina

Niilisk Ahti

Institute of Physics, University of Tartu, Tartu, 51014, Estonia

Pärs Martti

Institute of Physics, University of Tartu, Tartu, 51014, Estonia

Rähn Mihkel

Institute of Physics, University of Tartu, Tartu, 51014, Estonia

Wiesner Maciej

Hakonen Pertti

Low Temperature Laboratory, Aalto University, Espoo, P.O. Box 15100, Finland

Sammelselg Väino