Catalytic property of an indium-deposited powder-type material containing silicon and its dependence on the dose of indium nano-particles irradiated by a pulse arc plasma process
Satoru Yoshimura,
Yoshihiro Nishimoto,
Masato Kiuchi,
Yoshiaki Agawa,
Hiroyuki Tanaka,
Makoto Yasuda
Affiliations
Satoru Yoshimura
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
Yoshihiro Nishimoto
Department of Applied Chemistry, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
Masato Kiuchi
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
Yoshiaki Agawa
Advance Riko, Inc., 4388 Ikonobe-cho, Tsuzukiku, Yokohama, Kanagawa 224-0053, Japan
Hiroyuki Tanaka
Advance Riko, Inc., 4388 Ikonobe-cho, Tsuzukiku, Yokohama, Kanagawa 224-0053, Japan
Makoto Yasuda
Department of Applied Chemistry, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
Indium nano-particle irradiations onto zeolite powders were carried out using a pulse arc plasma source system. X-ray photoelectron spectroscopic and scanning electron microscopic studies of an indium irradiated zeolite sample revealed that indium nano-particles were successfully deposited on the sample. Besides, the sample was found to be capable of catalyzing an organic chemical reaction (i.e., Friedel-Crafts alkylation). Then, we examined whether or not the catalytic ability depends on the irradiated indium dose, having established the optimal indium dose for inducing the catalytic effect.
