Materials (Jun 2017)

Microstructure and Dielectric Properties of LPCVD/CVI-SiBCN Ceramics Annealed at Different Temperatures

  • Jianping Li,
  • Mingxi Zhao,
  • Yongsheng Liu,
  • Nan Chai,
  • Fang Ye,
  • Hailong Qin,
  • Laifei Cheng,
  • Litong Zhang

DOI
https://doi.org/10.3390/ma10060655
Journal volume & issue
Vol. 10, no. 6
p. 655

Abstract

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SiBCN ceramics were introduced into porous Si3N4 ceramics via a low-pressure chemical vapor deposition and infiltration (LPCVD/CVI) technique, and then the composite ceramics were heat-treated from 1400 °C to 1700 °C in a N2 atmosphere. The effects of annealing temperatures on microstructure, phase evolution, dielectric properties of SiBCN ceramics were investigated. The results revealed that α-Si3N4 and free carbon were separated below 1700 °C, and then SiC grains formed in the SiBCN ceramic matrix after annealing at 1700 °C through a phase-reaction between free carbon and α-Si3N4. The average dielectric loss of composites increased from 0 to 0.03 due to the formation of dispersive SiC grains and the increase of grain boundaries.

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