Spin-ARPES EUV Beamline for Ultrafast Materials Research and Development

Zhonghui Nie; Ion Cristian Edmond Turcu; Yao Li; Xiaoqian Zhang; Liang He; Jian Tu; Zhiqiang Ni; Huangfeng Xu; Yequan Chen; Xuezhong Ruan; Fabio Frassetto; Paolo Miotti; Nicola Fabris; Luca Poletto; Jing Wu; Qiangsheng Lu; Chang Liu; Thorsten Kampen; Ya Zhai; Wenqing Liu; Cephise Cacho; Xuefeng Wang; Fengqiu Wang; Yi Shi; Rong Zhang; Yongbing Xu

doi:10.3390/app9030370

Applied Sciences (Jan 2019)

Spin-ARPES EUV Beamline for Ultrafast Materials Research and Development

Zhonghui Nie,
Ion Cristian Edmond Turcu,
Yao Li,
Xiaoqian Zhang,
Liang He,
Jian Tu,
Zhiqiang Ni,
Huangfeng Xu,
Yequan Chen,
Xuezhong Ruan,
Fabio Frassetto,
Paolo Miotti,
Nicola Fabris,
Luca Poletto,
Jing Wu,
Qiangsheng Lu,
Chang Liu,
Thorsten Kampen,
Ya Zhai,
Wenqing Liu,
Cephise Cacho,
Xuefeng Wang,
Fengqiu Wang,
Yi Shi,
Rong Zhang,
Yongbing Xu

Affiliations

Zhonghui Nie: School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China
Ion Cristian Edmond Turcu: School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China
Yao Li: School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China
Xiaoqian Zhang: School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China
Liang He: School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China
Jian Tu: School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China
Zhiqiang Ni: School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China
Huangfeng Xu: School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China
Yequan Chen: School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China
Xuezhong Ruan: School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China
Fabio Frassetto: National Research Council Institute of Photonics and Nanotechnologies, 35131 Padova, Italy
Paolo Miotti: National Research Council Institute of Photonics and Nanotechnologies, 35131 Padova, Italy
Nicola Fabris: National Research Council Institute of Photonics and Nanotechnologies, 35131 Padova, Italy
Luca Poletto: National Research Council Institute of Photonics and Nanotechnologies, 35131 Padova, Italy
Jing Wu: Department of Physics, York University, York YO10 5DD, UK
Qiangsheng Lu: Shenzhen Institute for Quantum Science and Engineering, and Department of Physics, Southern University of Science and Technology, Shenzhen 518055, China
Chang Liu: Shenzhen Institute for Quantum Science and Engineering, and Department of Physics, Southern University of Science and Technology, Shenzhen 518055, China
Thorsten Kampen: Department of Solid State Physics, Technische Universität Berlin, 10623 Berlin, Germany
Ya Zhai: Department of Physics, Southeast University, Nanjing 210009, China
Wenqing Liu: Department of Electronic Engineering, Royal Holloway University of London, Egham TW20 0EX, UK
Cephise Cacho: Diamond Light Source Ltd., Harwell Campus, Oxfordshire OX11 0QX, UK
Xuefeng Wang: School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China
Fengqiu Wang: School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China
Yi Shi: School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China
Rong Zhang: School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China
Yongbing Xu: School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China

DOI: https://doi.org/10.3390/app9030370
Journal volume & issue: Vol. 9, no. 3
p. 370

Abstract

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A new femtosecond, Extreme Ultraviolet (EUV), Time Resolved Spin-Angle Resolved Photo-Emission Spectroscopy (TR-Spin-ARPES) beamline was developed for ultrafast materials research and development. This 50-fs laser-driven, table-top beamline is an integral part of the “Ultrafast Spintronic Materials Facility”, dedicated to engineering ultrafast materials. This facility provides a fast and in-situ analysis and development of new materials. The EUV source based on high harmonic generation process emits 2.3 × 1011 photons/second (2.3 × 108 photons/pulse) at H23 (35.7 eV) and its photon energy ranges from 10 eV to 75 eV, which enables surface sensitive studies of the electronic structure dynamics. The EUV monochromator provides the narrow bandwidth of the EUV beamline while preserving its pulse duration in an energy range of 10–100 eV. Ultrafast surface photovoltaic effect with ~650 fs rise-time was observed in p-GaAs (100) from time-resolved ARPES spectra. The data acquisition time could be reduced by over two orders of magnitude by scaling the laser driver from 1 KHz, 4W to MHz, KW average power.

Published in Applied Sciences

ISSN: 2076-3417 (Online)
Publisher: MDPI AG
Country of publisher: Switzerland
LCC subjects: Technology: Engineering (General). Civil engineering (General); Science: Biology (General); Science: Physics; Science: Chemistry
Website: http://www.mdpi.com/journal/applsci

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