APL Materials (Apr 2014)

Fabrication of highly spin-polarized Co2FeAl0.5Si0.5 thin-films

  • M. Vahidi,
  • J. A. Gifford,
  • S. K. Zhang,
  • S. Krishnamurthy,
  • Z. G. Yu,
  • L. Yu,
  • M. Huang,
  • C. Youngbull,
  • T. Y. Chen,
  • N. Newman

DOI
https://doi.org/10.1063/1.4869798
Journal volume & issue
Vol. 2, no. 4
pp. 046108 – 046108-7

Abstract

Read online

Ferromagnetic Heusler Co2FeAl0.5Si0.5 epitaxial thin-films have been fabricated in the L21 structure with saturation magnetizations over 1200 emu/cm3. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and annealed at high temperatures. However, the spin polarization is considerably smaller in samples deposited on heated substrates.