Advances of beveled mesas for GaN-based trench Schottky barrier diodes
Fuping Huang,
Xingyu Jia,
Yajin Liu,
Kangkai Tian,
Chunshuang Chu,
Quan Zheng,
Yonghui Zhang,
Zhen Xin,
Zi-Hui Zhang,
Qing Li
Affiliations
Fuping Huang
State Key Laboratory of Reliability and Intelligence of Electrical Equipment, Hebei University of Technology, 5340 Xiping Road, Beichen District, Tianjin 300401, People’s Republic of China
Xingyu Jia
State Key Laboratory of Reliability and Intelligence of Electrical Equipment, Hebei University of Technology, 5340 Xiping Road, Beichen District, Tianjin 300401, People’s Republic of China
Yajin Liu
State Key Laboratory of Reliability and Intelligence of Electrical Equipment, Hebei University of Technology, 5340 Xiping Road, Beichen District, Tianjin 300401, People’s Republic of China
Kangkai Tian
State Key Laboratory of Reliability and Intelligence of Electrical Equipment, Hebei University of Technology, 5340 Xiping Road, Beichen District, Tianjin 300401, People’s Republic of China
Chunshuang Chu
State Key Laboratory of Reliability and Intelligence of Electrical Equipment, Hebei University of Technology, 5340 Xiping Road, Beichen District, Tianjin 300401, People’s Republic of China
Quan Zheng
State Key Engineering Center of Flat-Panel-Display Glass and Equipment, 369 Zhujiang Road, High-Tech Zone, Shijiazhuang, Hebei Province 050035, People’s Republic of China
Yonghui Zhang
State Key Laboratory of Reliability and Intelligence of Electrical Equipment, Hebei University of Technology, 5340 Xiping Road, Beichen District, Tianjin 300401, People’s Republic of China
Zhen Xin
State Key Laboratory of Reliability and Intelligence of Electrical Equipment, Hebei University of Technology, 5340 Xiping Road, Beichen District, Tianjin 300401, People’s Republic of China
Zi-Hui Zhang
State Key Laboratory of Reliability and Intelligence of Electrical Equipment, Hebei University of Technology, 5340 Xiping Road, Beichen District, Tianjin 300401, People’s Republic of China
Qing Li
State Key Engineering Center of Flat-Panel-Display Glass and Equipment, 369 Zhujiang Road, High-Tech Zone, Shijiazhuang, Hebei Province 050035, People’s Republic of China
In this article, we propose and investigate a GaN-based trench metal–insulator–semiconductor barrier Schottky rectifier with a beveled mesa and field plate (BM-TMBS). According to our study, the beveled mesa and field plate structures help to reduce the density of potential lines at the mesa corner and deplete the drift region in two-dimensional mode, respectively. By doing so, the electric field at the bottom corner of the trenches and Schottky contact/GaN interface can be decreased significantly and the breakdown voltage can also be improved remarkably when compared with the conventional TMBS rectifiers and the planar Schottky barrier diodes. Meanwhile, assisted by the beveled mesa structure, the improved current spreading effect and a better conductivity modulation can be obtained in the forward-conduction state. Our studies also show that the electric field profiles and charge-coupling effect can be influenced by the mesa angle, the insulating layer thickness (Tox), and the trench depth (Dtr). As a result, the optimized BM-TMBS rectifiers can obtain a high BV of ∼2 kV and a current density of ∼3 kA/cm2 at the forward bias of 2 V.