Review for High-purity Quartz (SiO2) (Part Ⅱ): Activation and Separation of Lattice Impurities

Abstract

High-purity quartz, famous for low impurities and high purity, has been widely used in optical fiber communication, photovoltaic, aerospace, semiconductor display and other high-tech industries. The trace metal and nonmetallic elements (H, Li, B, Na, Al, P, K, Ca, Fe, Ti, etc.) widely occurring in quartz crystal structure are closely bound by Si-O-Si bond, which is difficult to be separated by conventional mineral processing technology. In this paper, the occurrence mechanism of trace elements bound by lattice in high-purity quartz is described in detail, and the advanced separation technology of trace elements in the crystal structure of high-quality quartz in the world is comprehensively and systematically summarized. Based on the research progress of the basic theory of high-purity quartz in China in recent years, some reasonable scientific suggestions on the basic theory of impurity separation of high-purity quartz lattice in China are put forward.

Keywords

• high-purity quartz
• lattice impurity
• activation and separation