4T Analog MOS Control-High Voltage High Frequency (HVHF) Plasma Switching Power Supply for Water Purification in Industrial Applications

T.  N. V. Krishna; P. Sathishkumar; P. Himasree; Dinah Punnoose; K.  V. G. Raghavendra; Himanshu; Bandari Naresh; R.  A. Rana; Hee-Je Kim

doi:10.3390/electronics7100245

Electronics (Oct 2018)

4T Analog MOS Control-High Voltage High Frequency (HVHF) Plasma Switching Power Supply for Water Purification in Industrial Applications

T. N. V. Krishna,
P. Sathishkumar,
P. Himasree,
Dinah Punnoose,
K. V. G. Raghavendra,
Himanshu,
Bandari Naresh,
R. A. Rana,
Hee-Je Kim

Affiliations

T. N. V. Krishna: School of Electrical Engineering, Pusan National University, Busandaehak-ro 63 beongil 2, Busan 46241, Korea
P. Sathishkumar: School of Electrical Engineering, Pusan National University, Busandaehak-ro 63 beongil 2, Busan 46241, Korea
P. Himasree: School of Electrical Engineering, Pusan National University, Busandaehak-ro 63 beongil 2, Busan 46241, Korea
Dinah Punnoose: Department of Computer Science and Engineering, Hindusthan Institute of Technology and Science, Chennai 603103, India
K. V. G. Raghavendra: School of Electrical Engineering, Pusan National University, Busandaehak-ro 63 beongil 2, Busan 46241, Korea
Himanshu: School of Electrical Engineering, Pusan National University, Busandaehak-ro 63 beongil 2, Busan 46241, Korea
Bandari Naresh: School of Electrical Engineering, Pusan National University, Busandaehak-ro 63 beongil 2, Busan 46241, Korea
R. A. Rana: School of Electrical Engineering, Pusan National University, Busandaehak-ro 63 beongil 2, Busan 46241, Korea
Hee-Je Kim: School of Electrical Engineering, Pusan National University, Busandaehak-ro 63 beongil 2, Busan 46241, Korea

DOI: https://doi.org/10.3390/electronics7100245
Journal volume & issue: Vol. 7, no. 10
p. 245

Abstract

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High-power plasma power supply is very useful for many industrial and medical applications. Plasma is generated artificially in the laboratory or industry by applying the electric or magnetic field. In this manuscript, we presented the simple 4T analog MOS control high voltage high frequency inverter circuit as a plasma power supply using modulation index technique. The presented plasma power supply operated at 25 kHz frequency and 10 kV peak to peak voltage. It generates a 0 V to 10 kV controllable electric field. The generated electric field is applied and produces plasma, which can be used for many industrial applications. A 10 kV to 5 kW plasma power supply has been practically developed based on the proposed topology and experimentally tested and, additionally, excellent output power conversion efficiency is achieved. From these results, the 4T analog MOS control high voltage high frequency (HVHF) plasma switching power supply is verified.

Published in Electronics

ISSN: 2079-9292 (Online)
Publisher: MDPI AG
Country of publisher: Switzerland
LCC subjects: Technology: Electrical engineering. Electronics. Nuclear engineering: Electronics
Website: http://www.mdpi.com/journal/electronics

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