Preparation of Microneedle Array Mold Based on MEMS Lithography Technology

Abstract

As a transdermal drug delivery technology, microneedle array (MNA) has the characteristics of painless, minimally invasive, and precise dosage. This work discusses and compares the new MNA mold prepared by our group using MEMS technology. First, we introduced the planar pattern-to-cross-section technology (PCT) method using LIGA (Photolithography, Galvanogormung, Abformung) technology to obtain a three-dimensional structure similar to an X-ray mask pattern. On this basis, combined with polydimethylsiloxane (PDMS) transfer technology and electroplating process, metal MNA can be prepared. The second method is to use silicon wet etching combined with the SU-8 process to obtain a PDMS quadrangular pyramid MNA using PDMS transfer technology. Third method is to use the tilting rotary lithography process to obtain PDMS conical MNA on SU-8 photoresist through PDMS transfer technology. All three processes utilize parallel subtractive manufacturing methods, and the error range of reproducibility and accuracy is 2–11%. LIGA technology produces hollow MNA with an aspect ratio of up to 30, which is used for blood extraction and drug injection. The height of the MNA prepared by the engraving process is about 600 μm, which can achieve a sustained release effect together with a potential systemic delivery. The height of the MNA prepared by the ultraviolet exposure process is about 150 μm, which is used to stimulate the subcutaneous tissue.

Keywords

• microneedle array mold
• micro-electro-mechanical system (MEMS)
• Photolithography, Galvanogormung, Abformung (LIGA)
• engraving process
• Ultraviolet (UV) tilting rotary lithography