Nanomaterials (Apr 2021)

Influence of Alumina Addition on the Optical Properties and the Thermal Stability of Titania Thin Films and Inverse Opals Produced by Atomic Layer Deposition

  • Martin Waleczek,
  • Jolien Dendooven,
  • Pavel Dyachenko,
  • Alexander Y. Petrov,
  • Manfred Eich,
  • Robert H. Blick,
  • Christophe Detavernier,
  • Kornelius Nielsch,
  • Kaline P. Furlan,
  • Robert Zierold

DOI
https://doi.org/10.3390/nano11041053
Journal volume & issue
Vol. 11, no. 4
p. 1053

Abstract

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TiO2 thin films deposited by atomic layer deposition (ALD) at low temperatures (2 parts is known to alter phase transitions and to stabilize crystalline phases. In this work, we have developed low-temperature ALD super-cycles to introduce Al2O3 into TiO2 thin films and photonic crystals. The aluminum oxide content was adjusted by varying the TiO2:Al2O3 internal loop ratio within the ALD super-cycle. Both thin films and inverse opal photonic crystal structures were subjected to thermal treatments ranging from 200 to 1200 °C and were characterized by in- and ex-situ X-ray diffraction, spectroscopic ellipsometry, and spectroscopic reflectance measurements. The results show that the introduction of alumina affects the crystallization and phase transition temperatures of titania as well as the optical properties of the inverse opal photonic crystals (iPhC). The thermal stability of the titania iPhCs was increased by the alumina introduction, maintaining their photonic bandgap even after heat treatment at 900 °C and outperforming the pure titania, with the best results being achieved with the super-cycles corresponding to an estimated alumina content of 26 wt.%.

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