Multinuclear Tin-Based Macrocyclic Organometallic Resist for EUV Photolithography

• Gayoung Lim,
• Kangsik Lee,
• Chawon Koh,
• Tsunehiro Nishi,
• Hyo Jae Yoon

Affiliations

Gayoung Lim

Department of Chemistry, Korea University, Seoul, Republic of Korea

Kangsik Lee

Department of Chemistry, Korea University, Seoul, Republic of Korea

Chawon Koh

Semiconductor R&D Center, Samsung Electronics Co., Ltd, Gyeonggi-do, Republic of Korea

Tsunehiro Nishi

Semiconductor R&D Center, Samsung Electronics Co., Ltd, Gyeonggi-do, Republic of Korea

Hyo Jae Yoon

Department of Chemistry, Korea University, Seoul, Republic of Korea