Sensitivity-Enhancing Modified Holographic Photopolymer of PQ/PMMA

Junhui Wu; Junchao Jin; Po Hu; Jinhong Li; Zeyi Zeng; Qingdong Li; Jie Liu; Mingyong Chen; Zuoyu Zhang; Li Wang; Xiao Lin; Xiaodi Tan

doi:10.3390/polym16111484

Polymers (May 2024)

Sensitivity-Enhancing Modified Holographic Photopolymer of PQ/PMMA

Junhui Wu,
Junchao Jin,
Po Hu,
Jinhong Li,
Zeyi Zeng,
Qingdong Li,
Jie Liu,
Mingyong Chen,
Zuoyu Zhang,
Li Wang,
Xiao Lin,
Xiaodi Tan

Affiliations

Junhui Wu: College of Photonic and Electronic Engineering, Fujian Normal University, Fuzhou 350117, China
Junchao Jin: College of Photonic and Electronic Engineering, Fujian Normal University, Fuzhou 350117, China
Po Hu: Henan Provincial Key Laboratory of Intelligent Lighting, Huanghuai University, Zhumadian 463000, China
Jinhong Li: College of Photonic and Electronic Engineering, Fujian Normal University, Fuzhou 350117, China
Zeyi Zeng: College of Photonic and Electronic Engineering, Fujian Normal University, Fuzhou 350117, China
Qingdong Li: College of Photonic and Electronic Engineering, Fujian Normal University, Fuzhou 350117, China
Jie Liu: College of Photonic and Electronic Engineering, Fujian Normal University, Fuzhou 350117, China
Mingyong Chen: College of Photonic and Electronic Engineering, Fujian Normal University, Fuzhou 350117, China
Zuoyu Zhang: College of Photonic and Electronic Engineering, Fujian Normal University, Fuzhou 350117, China
Li Wang: College of Photonic and Electronic Engineering, Fujian Normal University, Fuzhou 350117, China
Xiao Lin: Information Photonics Research Center, Key Laboratory of Optoelectronic Science and for Medicine of Ministry of Education, Fujian Provincial Key Laboratory of Photonics Technology, Fujian Provincial Engineering Technology Research Center of Photoelectric Sensing Application, Fujian Normal University, Fuzhou 350117, China
Xiaodi Tan: Information Photonics Research Center, Key Laboratory of Optoelectronic Science and for Medicine of Ministry of Education, Fujian Provincial Key Laboratory of Photonics Technology, Fujian Provincial Engineering Technology Research Center of Photoelectric Sensing Application, Fujian Normal University, Fuzhou 350117, China

DOI: https://doi.org/10.3390/polym16111484
Journal volume & issue: Vol. 16, no. 11
p. 1484

Abstract

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Phenanthrenequinone-doped poly(methyl methacrylate) (PQ/PMMA) photopolymers are potential holographic storage media owing to their high-density storage capacities, low costs, high stability, and negligible shrinkage in volume holographic permanent memory. However, because of the limitations of the substrate, conventional Plexiglas materials do not exhibit a good performance in terms of photosensitivity and molding. In this study, the crosslinked structure of PMMA was modified by introducing a dendrimer monomer, pentaerythritol tetraacrylate (PETA), which increases the photosensitivity of the material 2 times (from ~0.58 cm/J to ~1.18 cm/J), and the diffraction efficiency is increased 1.6 times (from ~50% to ~80%). In addition, the modified material has a superior ability to mold compared to conventional materials. Moreover, the holographic performance enhancement was evaluated in conjunction with a quantum chemical analysis. The doping of PETA resulted in an overall decrease in the energy required for the reaction system of the material, and the activation energy decreased by ~0.5 KJ/mol in the photoreaction stage.

Published in Polymers

ISSN: 2073-4360 (Online)
Publisher: MDPI AG
Country of publisher: Switzerland
LCC subjects: Science: Chemistry: Organic chemistry
Website: http://www.mdpi.com/journal/polymers/

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