OBTAINING A CATHODE TARGET OF SILICIDES FOR VACUUM ION-PLASMA SOURCES

Abstract

The coatings based on silicides of various metals are widely used in various industries by vacuum-plasma processes for products treatment. The quality of such coatings is determined by the degree of chemical purity of the target cathode, the correct choice of a mixture of process gases and the level of accelerating potential supplied to the substrate. Traditional methods for producing multi-component targets have a number of disadvantages, such as: high residual porosity, excess content of impurities, as well as the need for expensive equipment.The use of casting technologies in the production of target cathodes is promising. The paper presents the generalized results of experimental studies of manufacturing target cathodes for vacuum ion-plasma sources by methods of reduction and high-speed induction melting. Silicides of titanium, copper and nickel were used as the material.

Keywords

• complex silicides
• reduction and induction melting
• cast cathodes-targets
• macroand microstructure