Feature size below 100 nm realized by UV-LED-based microscope projection photolithography

Abstract

The demand for miniaturization and integration of optical elements has fostered the development of various micro- and nanofabrication technologies. In this work, we developed a low-cost UV-LED-based microscope projection photolithography system for rapid and high-resolution fabrication. This system can be easily implemented using off-the-shelf components. It allows for micro- and nanostructuring within seconds. By optimizing the process, a minimum feature size down to approximately 85 nm was successfully realized. In addition, investigations on fabrication of the same structures using both costly and economic microscope objectives were performed. Feature sizes below 100 nm can be stably achieved. The demonstrated approach extends the technology capabilities and may find applications in fields such as nanophotonics, biophotonics sensing and material science.

Keywords

• microfabrication
• nanofabrication
• subwavelength structuring
• projection lithography
• uv-led lithography