Química Nova (Jul 2002)

Xerogel p-anisidinapropilsílica: estudo da estabilidade térmica e da resistência à lixiviação com solventes p-anisidinepropylsilica xerogel: thermal stability and resistance to leaching by solvents

  • Leonardo Franken,
  • Lisiane S. dos Santos,
  • Elina B. Caramão,
  • Tania M. H. Costa,
  • Edilson V. Benvenutti

DOI
https://doi.org/10.1590/S0100-40422002000400010
Journal volume & issue
Vol. 25, no. 4
pp. 563 – 566

Abstract

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The xerogel p-anisidinepropylsilica was obtained. This solid presents some residual paraffin and also a small fraction of high organofunctionalized material that was leached in polar solvent. The xerogel purification could be achieved by exhaustively washing with hexane and dichloromethane solvents, or submitting the xerogel to thermal treatment up to 300 ºC, in vacuum. The resulting purified xerogel material present an appreciable thermal stability and resistance to leaching by solvents.

Keywords