Frontiers in Materials (Mar 2021)

Geometric and Electronic Properties of Monolayer HfX2 (X = S, Se, or Te): A First-Principles Calculation

  • Thi My Duyen Huynh,
  • Duy Khanh Nguyen,
  • Thi Dieu Hien Nguyen,
  • Vo Khuong Dien,
  • Hai Duong Pham,
  • Ming-Fa Lin,
  • Ming-Fa Lin

DOI
https://doi.org/10.3389/fmats.2020.569756
Journal volume & issue
Vol. 7

Abstract

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The essential properties of monolayer HfX2 (X = S, Se, or Te) are fully explored by first-principles calculations. The optimal lattice symmetries, sublattice buckling, electronic energy spectra, and density of states are systematically investigated. Monolayer HfS2, HfSe2, and HfTe2, respectively, belong to middle-gap semiconductor, narrow-gap one and semimetal, with various energy dispersions. Moreover, the van Hove singularities (vHs) mainly arise from the band-edge states, and their special structures in the density of states strongly depend on their two or three-dimensional structures and the critical points in the energy-wave-vector space. The above-mentioned theoretical predictions are attributed to the multi-orbital hybridizations of [dx2−y2, dxy, dyz, dzx, dz2]–[s, px, py, pz] in the Hf-X chemical bonds. The diversified physical phenomena clearly indicate a high potential for applications, as observed in MoS2-related emergent materials ions.

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