Nanoscale Printing of Indium-Tin-Oxide by Femtosecond Laser Pulses
Jingwen Hu,
Zhen-Ze Li,
Yang-Yang Zhao,
Yi-Shi Xu,
Lin Wang,
Molong Han,
Lachlan Hyde,
Soon Hock Ng,
Lei Wang,
Saulius Juodkazis
Affiliations
Jingwen Hu
Optical Sciences Centre and ARC Training Centre in Surface Engineering for Advanced Materials (SEAM), School of Science, Swinburne University of Technology, Hawthorn, VIC 3122, Australia
Zhen-Ze Li
State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
Yang-Yang Zhao
State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
Yi-Shi Xu
State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
Lin Wang
State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
Molong Han
Optical Sciences Centre and ARC Training Centre in Surface Engineering for Advanced Materials (SEAM), School of Science, Swinburne University of Technology, Hawthorn, VIC 3122, Australia
Lachlan Hyde
Space Technology and Industry Institute, Graphene Certification Labs, Swinburne University of Technology, Hawthorn, VIC 3122, Australia
Soon Hock Ng
Optical Sciences Centre and ARC Training Centre in Surface Engineering for Advanced Materials (SEAM), School of Science, Swinburne University of Technology, Hawthorn, VIC 3122, Australia
Lei Wang
State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
Saulius Juodkazis
Optical Sciences Centre and ARC Training Centre in Surface Engineering for Advanced Materials (SEAM), School of Science, Swinburne University of Technology, Hawthorn, VIC 3122, Australia
For constructing optical and electrical micro-devices, the deposition/printing of materials with sub-1 μm precision and size (cross-section) is required. Crystalline c-ITO (indium tin oxide) nanostructures were patterned on glass with sufficient precision to form 20–50 nm gaps between individual disks or lines of ∼250 nm diameter or width. The absorbed energy density [J/cm3] followed a second-order dependence on pulse energy. This facilitated high-resolution and precise nanoscale laser-writing at a laser wavelength of 515 nm. Patterns for optical elements such as circular gratings and micro-disks were laser-printed using ITO as a resist. Unexposed amorphous a-ITO was chemically removed in aqueous 1% vol. HF solution. This use of a-ITO as a solid resist holds promise for metamaterial and micro-optical applications.
