APL Materials (May 2018)

In-line metrology for roll-to-roll UV assisted nanoimprint lithography using diffractometry

  • Martin Kreuzer,
  • Guy L. Whitworth,
  • Achille Francone,
  • Jordi Gomis-Bresco,
  • Nikolaos Kehagias,
  • Clivia M. Sotomayor-Torres

DOI
https://doi.org/10.1063/1.5011740
Journal volume & issue
Vol. 6, no. 5
pp. 058502 – 058502-6

Abstract

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We describe and discuss the optical design of a diffractometer to carry out in-line quality control during roll-to-roll nanoimprinting. The tool measures diffractograms in reflection geometry, through an aspheric lens to gain fast, non-invasive information of any changes to the critical dimensions of target grating structures. A stepwise tapered linear grating with constant period was fabricated in order to detect the variation in grating linewidth through diffractometry. The minimum feature change detected was ∼40 nm to a precision of 10 nm. The diffractometer was then integrated with a roll-to-roll UV assisted nanoimprint lithography machine to gain dynamic measurements in situ.