Fourier ellipsometry – an ellipsometric approach to Fourier scatterometry

Abstract

An extension of Fourier scatterometry is presented, aiming at increasing the sensitivity by measuring the phase difference between the reflections polarized parallel and perpendicular to the plane of incidence. The ellipsometric approach requires no additional hardware elements compared with conventional Fourier scatterometry. Furthermore, incoherent illumination is also sufficient, which enables spectroscopy using standard low-cost light sources.

Keywords

• optical metrology
• ellipsometry
• scatterometry
• rcwa
• fourier scatterometry
• sensitivity