Nature Communications (Dec 2022)

Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control

  • Chi Thang Nguyen,
  • Eun-Hyoung Cho,
  • Bonwook Gu,
  • Sunghee Lee,
  • Hae-Sung Kim,
  • Jeongwoo Park,
  • Neung-Kyung Yu,
  • Sangwoo Shin,
  • Bonggeun Shong,
  • Jeong Yub Lee,
  • Han-Bo-Ram Lee

DOI
https://doi.org/10.1038/s41467-022-35428-6
Journal volume & issue
Vol. 13, no. 1
pp. 1 – 10

Abstract

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Integrating bottom-up and top-down fabrication techniques can overcome limits in nanofabrication. Here authors demonstrate an approach for area selective deposition using Ti as an inhibitor in the atomic layer deposition process to achieve controlled growth of seamless TiO2 layers on 3D structures.