Freestanding nanostructures via reactive ion beam angled
          etching

Haig A. Atikian; Pawel Latawiec; Michael J. Burek; Young-Ik Sohn; Srujan Meesala; Normand Gravel; Ammar B. Kouki; Marko Lončar

doi:10.1063/1.4982603

APL Photonics (May 2017)

Freestanding nanostructures via reactive ion beam angled etching

Haig A. Atikian,
Pawel Latawiec,
Michael J. Burek,
Young-Ik Sohn,
Srujan Meesala,
Normand Gravel,
Ammar B. Kouki,
Marko Lončar

Affiliations

Haig A. Atikian: School of Engineering and Applied Sciences, Harvard University, 33 Oxford Street, Cambridge, Massachusetts 02138, USA
Pawel Latawiec: School of Engineering and Applied Sciences, Harvard University, 33 Oxford Street, Cambridge, Massachusetts 02138, USA
Michael J. Burek: School of Engineering and Applied Sciences, Harvard University, 33 Oxford Street, Cambridge, Massachusetts 02138, USA
Young-Ik Sohn: School of Engineering and Applied Sciences, Harvard University, 33 Oxford Street, Cambridge, Massachusetts 02138, USA
Srujan Meesala: School of Engineering and Applied Sciences, Harvard University, 33 Oxford Street, Cambridge, Massachusetts 02138, USA
Normand Gravel: LACIME Laboratory, École de Technologie Supérieure, Montréal, Quebec H3C 1K3, Canada
Ammar B. Kouki: LACIME Laboratory, École de Technologie Supérieure, Montréal, Quebec H3C 1K3, Canada
Marko Lončar: School of Engineering and Applied Sciences, Harvard University, 33 Oxford Street, Cambridge, Massachusetts 02138, USA

DOI: https://doi.org/10.1063/1.4982603
Journal volume & issue: Vol. 2, no. 5
pp. 051301 – 051301-6

Abstract

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Freestanding nanostructures play an important role in optical and mechanical devices for classical and quantum applications. Here, we use reactive ion beam angled etching to fabricate optical resonators in bulk polycrystalline and single crystal diamond. Reported quality factors are approximately 30 000 and 286 000, respectively. The devices show uniformity across 25 mm samples, a significant improvement over comparable techniques yielding freestanding nanostructures.

Published in APL Photonics

ISSN: 2378-0967 (Online)
Publisher: AIP Publishing LLC
Country of publisher: United States
LCC subjects: Technology: Engineering (General). Civil engineering (General): Applied optics. Photonics
Website: https://aplphotonics.aip.org

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