Materials (Sep 2022)

A New Cell Topology for 4H-SiC Planar Power MOSFETs for High-Frequency Switching

  • Shengnan Zhu,
  • Tianshi Liu,
  • Junchong Fan,
  • Arash Salemi,
  • Marvin H. White,
  • David Sheridan,
  • Anant K. Agarwal

DOI
https://doi.org/10.3390/ma15196690
Journal volume & issue
Vol. 15, no. 19
p. 6690

Abstract

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A new cell topology named the dodecagonal (a polygon with twelve sides, short for Dod) cell is proposed to optimize the gate-to-drain capacitance (Cgd) and reduce the specific ON-resistance (Ron,sp) of 4H-SiC planar power MOSFETs. The Dod and the octagonal (Oct) cells are used in the layout design of the 650 V SiC MOSFETs in this work. The experimental results confirm that the Dod-cell MOSFET achieves a 2.2× lower Ron,sp, 2.1× smaller high-frequency figure of merit (HF-FOM), higher turn on/off dv/dt, and 29% less switching loss than the fabricated Oct-cell MOSFET. The results demonstrate that the Dod cell is an attractive candidate for high-frequency power applications.

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