Instruments (Mar 2024)
A High-Flux Compact X-ray Free-Electron Laser for Next-Generation Chip Metrology Needs
- James B. Rosenzweig,
- Gerard Andonian,
- Ronald Agustsson,
- Petr M. Anisimov,
- Aurora Araujo,
- Fabio Bosco,
- Martina Carillo,
- Enrica Chiadroni,
- Luca Giannessi,
- Zhirong Huang,
- Atsushi Fukasawa,
- Dongsung Kim,
- Sergey Kutsaev,
- Gerard Lawler,
- Zenghai Li,
- Nathan Majernik,
- Pratik Manwani,
- Jared Maxson,
- Janwei Miao,
- Mauro Migliorati,
- Andrea Mostacci,
- Pietro Musumeci,
- Alex Murokh,
- Emilio Nanni,
- Sean O’Tool,
- Luigi Palumbo,
- River Robles,
- Yusuke Sakai,
- Evgenya I. Simakov,
- Madison Singleton,
- Bruno Spataro,
- Jingyi Tang,
- Sami Tantawi,
- Oliver Williams,
- Haoran Xu,
- Monika Yadav
Affiliations
- James B. Rosenzweig
- Department of Physics and Astronomy, University of California, Los Angeles, 470 Portola Plaza, Los Angeles, CA 90095, USA
- Gerard Andonian
- Department of Physics and Astronomy, University of California, Los Angeles, 470 Portola Plaza, Los Angeles, CA 90095, USA
- Ronald Agustsson
- RadiaBeam Technologies, 1717 Stewart Ave., Santa Monica, CA 90404, USA
- Petr M. Anisimov
- Los Alamos National Laboratory, Los Alamos, NM 87545, USA
- Aurora Araujo
- RadiaBeam Technologies, 1717 Stewart Ave., Santa Monica, CA 90404, USA
- Fabio Bosco
- Department of Physics and Astronomy, University of California, Los Angeles, 470 Portola Plaza, Los Angeles, CA 90095, USA
- Martina Carillo
- Dipartimento di Scienze di Base e Applicate per l’Ingegneria, University of Rome “La Sapienza”, 00161 Rome, Italy
- Enrica Chiadroni
- Dipartimento di Scienze di Base e Applicate per l’Ingegneria, University of Rome “La Sapienza”, 00161 Rome, Italy
- Luca Giannessi
- INFN Laboratori Nazionali di Frascati, Via Enrico Fermi, 54, 00044 Rome, Italy
- Zhirong Huang
- SLAC National Accelerator Laboratory, 2575 Sand Hill Rd., Menlo Park, CA 94025, USA
- Atsushi Fukasawa
- Department of Physics and Astronomy, University of California, Los Angeles, 470 Portola Plaza, Los Angeles, CA 90095, USA
- Dongsung Kim
- Los Alamos National Laboratory, Los Alamos, NM 87545, USA
- Sergey Kutsaev
- RadiaBeam Technologies, 1717 Stewart Ave., Santa Monica, CA 90404, USA
- Gerard Lawler
- Department of Physics and Astronomy, University of California, Los Angeles, 470 Portola Plaza, Los Angeles, CA 90095, USA
- Zenghai Li
- SLAC National Accelerator Laboratory, 2575 Sand Hill Rd., Menlo Park, CA 94025, USA
- Nathan Majernik
- SLAC National Accelerator Laboratory, 2575 Sand Hill Rd., Menlo Park, CA 94025, USA
- Pratik Manwani
- Department of Physics and Astronomy, University of California, Los Angeles, 470 Portola Plaza, Los Angeles, CA 90095, USA
- Jared Maxson
- Department of Physics, Cornell University, 109 Clark Hall, Ithaca, NY 14853, USA
- Janwei Miao
- Department of Physics and Astronomy, University of California, Los Angeles, 470 Portola Plaza, Los Angeles, CA 90095, USA
- Mauro Migliorati
- Dipartimento di Scienze di Base e Applicate per l’Ingegneria, University of Rome “La Sapienza”, 00161 Rome, Italy
- Andrea Mostacci
- Dipartimento di Scienze di Base e Applicate per l’Ingegneria, University of Rome “La Sapienza”, 00161 Rome, Italy
- Pietro Musumeci
- Department of Physics and Astronomy, University of California, Los Angeles, 470 Portola Plaza, Los Angeles, CA 90095, USA
- Alex Murokh
- RadiaBeam Technologies, 1717 Stewart Ave., Santa Monica, CA 90404, USA
- Emilio Nanni
- SLAC National Accelerator Laboratory, 2575 Sand Hill Rd., Menlo Park, CA 94025, USA
- Sean O’Tool
- Department of Physics and Astronomy, University of California, Los Angeles, 470 Portola Plaza, Los Angeles, CA 90095, USA
- Luigi Palumbo
- Dipartimento di Scienze di Base e Applicate per l’Ingegneria, University of Rome “La Sapienza”, 00161 Rome, Italy
- River Robles
- SLAC National Accelerator Laboratory, 2575 Sand Hill Rd., Menlo Park, CA 94025, USA
- Yusuke Sakai
- Department of Physics and Astronomy, University of California, Los Angeles, 470 Portola Plaza, Los Angeles, CA 90095, USA
- Evgenya I. Simakov
- Los Alamos National Laboratory, Los Alamos, NM 87545, USA
- Madison Singleton
- SLAC National Accelerator Laboratory, 2575 Sand Hill Rd., Menlo Park, CA 94025, USA
- Bruno Spataro
- INFN Laboratori Nazionali di Frascati, Via Enrico Fermi, 54, 00044 Rome, Italy
- Jingyi Tang
- SLAC National Accelerator Laboratory, 2575 Sand Hill Rd., Menlo Park, CA 94025, USA
- Sami Tantawi
- SLAC National Accelerator Laboratory, 2575 Sand Hill Rd., Menlo Park, CA 94025, USA
- Oliver Williams
- Department of Physics and Astronomy, University of California, Los Angeles, 470 Portola Plaza, Los Angeles, CA 90095, USA
- Haoran Xu
- Los Alamos National Laboratory, Los Alamos, NM 87545, USA
- Monika Yadav
- Department of Physics and Astronomy, University of California, Los Angeles, 470 Portola Plaza, Los Angeles, CA 90095, USA
- DOI
- https://doi.org/10.3390/instruments8010019
- Journal volume & issue
-
Vol. 8,
no. 1
p. 19
Abstract
Recently, considerable work has been directed at the development of an ultracompact X-ray free-electron laser (UCXFEL) based on emerging techniques in high-field cryogenic acceleration, with attendant dramatic improvements in electron beam brightness and state-of-the-art concepts in beam dynamics, magnetic undulators, and X-ray optics. A full conceptual design of a 1 nm (1.24 keV) UCXFEL with a length and cost over an order of magnitude below current X-ray free-electron lasers (XFELs) has resulted from this effort. This instrument has been developed with an emphasis on permitting exploratory scientific research in a wide variety of fields in a university setting. Concurrently, compact FELs are being vigorously developed for use as instruments to enable next-generation chip manufacturing through use as a high-flux, few nm lithography source. This new role suggests consideration of XFELs to urgently address emerging demands in the semiconductor device sector, as identified by recent national need studies, for new radiation sources aimed at chip manufacturing. Indeed, it has been shown that one may use coherent X-rays to perform 10–20 nm class resolution surveys of macroscopic, cm scale structures such as chips, using ptychographic laminography techniques. As the XFEL is a very promising candidate for realizing such methods, we present here an analysis of the issues and likely solutions associated with extending the UCXFEL to harder X-rays (above 7 keV), much higher fluxes, and increased levels of coherence, as well as methods of applying such a source for ptychographic laminography to microelectronic device measurements. We discuss the development path to move the concept to rapid realization of a transformative XFEL-based application, outlining both FEL and metrology system challenges.
Keywords
