EPJ Web of Conferences (Jan 2019)

Testing and characterization of challenging optics and optical systems with Shack Hartmann wavefront sensors

  • Siv Julie,
  • Mayer Rafael,
  • Beaugrand Guillaume,
  • Tison Guillaume,
  • Juvénal Rémy,
  • Dovillaire Guillaume

DOI
https://doi.org/10.1051/epjconf/201921506003
Journal volume & issue
Vol. 215
p. 06003

Abstract

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The Shack-Hartman wavefront sensor is a common metrology tool in the field of laser, adaptive optics and astronomy. However, this technique is still scarcely used in optics and optical system metrology. With the development of manufacturing techniques and the increasing need for optical characterization in the industry, the Shack-Hartmann wavefront sensor emerges as an efficient complementary tool to the well-established Fizeau interferometry for optical system metrology. Moreover, the raise of smart vehicles equipped with optical sensors and augmented reality, the optical characterization of glass and transparent flat materials becomes an issue that can be addressed with Shack-Hartmann sensors. Aberration measurements of challenging optics will be presented such as optical filters, thin flat optics, aspheric lenses and large optical assemblies.