Tekhnologiya i Konstruirovanie v Elektronnoi Apparature (Oct 2010)

The properties of metal contacts on TiO2 thin films produced by reactive magnetron sputtering

  • Brus V. V.,
  • Kovaluk Z. D.,
  • Maryanchuk P. D.,
  • Orletsky I. G.,
  • Maystruk E. V.

Journal volume & issue
no. 5-6
pp. 60 – 62

Abstract

Read online

The article deals with research on volt-ampere characteristics of metal contacts (Al, Cr, In, Mo, Ti) on titanium dioxide thin films and influence of annealing in vacuum on their electric properties. Volt-ampere characteristics measurements were taken by three-probe method. There was established that indium contact on TiO2 thin films possessed sharply defined ohmic properties.

Keywords