Research on rapid growth of monolayer graphene by vertical cold-wall CVD method

Abstract

Chemical vapor deposition (CVD) is one of the most important methods for the preparation of graphene. Graphene is usually prepared using horizontal tube CVD (HT-CVD) method. However, the preparation of this method is too long, generally more than 2 h. In this article, a method called vertical cold-wall CVD (VCW-CVD) method was introduced for graphene preparation. Due to the vertical angle between direction of gas flow and sample surface, the reaction process of this method for graphene preparation is only 1 min. Accordingly, in this article, the modified parameter of graphene preparation by this method was discussed. Besides, the VCW-CVD graphene had an equal quality with the HT-CVD graphene, which was proved by measurement of conductivity, transmittance and heat stability.

Keywords

• graphene
• cvd
• rapid growth
• vertical cold-wall