The influence of precision polishing parameters on surface roughness of resin-rich layer on antenna reflective surface

Abstract

The new generation antenna has high-quality processing requirements on the resin-rich layer of the reflecting surface. A polishing experiment on the resin-rich layer was carried out to study the parameters affecting the surface roughness of the layer, namely polishing time, abrasive particle size, abrasive particle mass fraction, loading pressure and polishing speed. The results show that under the current conditions, the surface roughness first decreases and then tends to be stable with the increase of polishing time. It increases with the increase of the abrasive particle size or the loading pressure, and first decreases and then increases with the increase of the abrasive particle mass fraction or the polishing speed. On this basis, an optimized process parameter combination is formed, which includes an abrasive size of 25 nm, an abrasive particle mass fraction of 20%, a loading pressure of 14.1 kPa, a polishing speed of 50 r/min, a polishing time of 1.0 hours, and a slurry flow rate of 10 mL/min. A high-quality resin rich layer polished surface with a surface roughness Sa of 4.73 nm can be obtained by machining with this parameter combination.

Keywords

• epoxy resin
• polishing
• surface roughness
• process parameters