TSSOI as an efficient tool for diagnostics of SOI technology in Institute of Electron Technology

Abstract

This paper reports a test structure for characterization of a new technology combining a standard CMOS process with pixel detector manufacturing technique. These processes are combined on a single thick-film SOI wafer. Preliminary results of the measurements performed on both MOS SOI transistors and dedicated SOI test structures are described in detail.

Keywords

• SOI CMOS technology
• pixel detector
• test structure