Nanoscale Research Letters (Jan 2018)

Fabrication of SrGe2 thin films on Ge (100), (110), and (111) substrates

  • T. Imajo,
  • K. Toko,
  • R. Takabe,
  • N. Saitoh,
  • N. Yoshizawa,
  • T. Suemasu

DOI
https://doi.org/10.1186/s11671-018-2437-1
Journal volume & issue
Vol. 13, no. 1
pp. 1 – 5

Abstract

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Abstract Semiconductor strontium digermanide (SrGe2) has a large absorption coefficient in the near-infrared light region and is expected to be useful for multijunction solar cells. This study firstly demonstrates the formation of SrGe2 thin films via a reactive deposition epitaxy on Ge substrates. The growth morphology of SrGe2 dramatically changed depending on the growth temperature (300−700 °C) and the crystal orientation of the Ge substrate. We succeeded in obtaining single-oriented SrGe2 using a Ge (110) substrate at 500 °C. Development on Si or glass substrates will lead to the application of SrGe2 to high-efficiency thin-film solar cells.

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