AIP Advances (Apr 2020)

Electron quantum interference in epitaxial antiferromagnetic NiO thin films

  • Jia Xu,
  • Feng Lou,
  • Mengwen Jia,
  • Gong Chen,
  • Chao Zhou,
  • Qian Li,
  • Kai Liu,
  • Andreas K. Schmid,
  • Hongjun Xiang,
  • Yizheng Wu

DOI
https://doi.org/10.1063/1.5129772
Journal volume & issue
Vol. 10, no. 4
pp. 045204 – 045204-5

Abstract

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The electron reflectivity from NiO thin films grown on Ag(001) has been systematically studied as a function of film thickness and electron energy. A strong electron quantum interference effect was observed from the NiO film, which is used to derive the unoccupied band dispersion above the Fermi surface along the Γ−X direction using the phase accumulation model. The experimental bands agree well with first-principles calculations. A weaker electron quantum interference effect was also observed from the CoO film.