RAMAN SCATTERING IN CONDENSATE PRODUCTS OF ION-BEAM AND MAGNETRON SPUTTERING OF GRAPHITE

Abstract

There has been a spectroscopic analysis of Raman scattering and an analysis of atomic-force microscopyfor disordered carbon thin films vacuum-deposited on silicon substrate using scattering of graphite target. The comparative experiments and evaluations were done under different conditions both using impulse magnetron (Ar, Ar:CH4) and ion-beam Ar+ method for graphite sputtering. There was an analysis of the informational capacity of light scattering specters and AFM-images of nanostructured and amorphous film samples. Based on the analytical data, there was a study into the synthesis conditions as well as film spectral features; there was also an evaluation done of the potential offered by spectroscopy of Raman scattering viewed as a source of data regarding carbon studies.

Keywords

• комбинационное рассеивание света
• магнетронное распыление
• ионно-лучевое распыление
• осаждение тонких пленок
• разупорядоченный углерод
• наноуглерод
• асм
• raman scattering
• magnetron sputtering
• ion-beam sputtering
• thin film depositing
• disordered carbon
• nanocarbon
• afm