EPJ Photovoltaics (Jan 2023)

Edge passivation of shingled poly-Si/SiOx passivated contacts solar cells

  • Dhainaut Franck,
  • Dabadie Raoul,
  • Martel Benoit,
  • Desrues Thibaut,
  • Albaric Mickaël,
  • Palais Olivier,
  • Dubois Sébastien,
  • Harrison Samuel

DOI
https://doi.org/10.1051/epjpv/2023013
Journal volume & issue
Vol. 14
p. 22

Abstract

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This work aims at the full recovery of efficiency losses induced by shingling double-side poly-Si/SiOx passivated contacts crystalline silicon solar cells. It focuses on thermally-activated Aluminium Oxide (AlOx) layers elaborated by thermal Atomic Layer Deposition (ALD) to passivate the edges of shingled cells cut by using the innovative “45° tilt squaring approach”. The whole procedure featuring high-temperature AlOx annealing led to very low cut-related performance losses. Indeed, the efficiency and FF of the passivated shingled cells surpassed the values obtained for the as-cut shingles by 0.5%abs and 2.6%abs, respectively. Approaches for further improvements are also discussed, particularly to overcome the short-circuit current density decrease observed for passivated shingles.

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