DIFFERENT SCHEMES FOR OBTAINING FRACTAL RELIEF OF NANOSIZED PLATINUM FILMS

Abstract

The morphology of the relief of nanosized platinum films on the mica surface is investigated using the scanning probe (in the atomic force mode) and tunneling microscopy. Platinum films were investigated immediately after their preparation in a magnetron sputtering facility, as well as after annealing in a muffle furnace in an air atmosphere. Annealing made it possible to establish the possible ranges of variation of the fractal dimension and the altitude parameters corresponding to degradation of the nanorelief. The values of the fractal dimension were obtained for films of different thicknesses using two alternative methods of investigation at different initial scales of samples: based on the data of an atomic force microscope – Dc=2,17÷2,38 and a scanning tunneling microscope – Dc=2,28÷2,50 depending on the sequence of deposition of layers and annealing of films. For comparison, experimental data of other authors are presented. The choice of the sequence of operations for magnetron sputtering and annealing, and external conditions makes it possible to formulate recommendations for development of the technology for «growing» structures with a given surface morphology.

Keywords

• scanning probe microscopy
• atomic force microscope mode
• scanning tunneling microscopy
• magnetron sputtering
• annealing
• nanorelief
• roughness parameters
• fractal dimension
• platinum films