Roles of Atomic Nitrogen/Hydrogen in GaN Film Growth by Chemically Assisted Sputtering with Dual Plasma Sources

• Atsushi Tanide,
• Shohei Nakamura,
• Akira Horikoshi,
• Shigeru Takatsuji,
• Takahiro Kimura,
• Kazuo Kinose,
• Soichi Nadahara,
• Masazumi Nishikawa,
• Akinori Ebe,
• Kenji Ishikawa,
• Osamu Oda,
• Masaru Hori

Affiliations

Atsushi Tanide

Rakusei Operation Center, SCREEN Holdings Co., Ltd., Kyoto, Japan

Shohei Nakamura

Rakusei Operation Center, SCREEN Holdings Co., Ltd., Kyoto, Japan

Akira Horikoshi

Rakusei Operation Center, SCREEN Holdings Co., Ltd., Kyoto, Japan

Shigeru Takatsuji

Rakusei Operation Center, SCREEN Holdings Co., Ltd., Kyoto, Japan

Takahiro Kimura

Rakusei Operation Center, SCREEN Holdings Co., Ltd., Kyoto, Japan

Kazuo Kinose

Rakusei Operation Center, SCREEN Holdings Co., Ltd., Kyoto, Japan

Soichi Nadahara

Rakusei Operation Center, SCREEN Holdings Co., Ltd., Kyoto, Japan

Masazumi Nishikawa

EMD Corp, Yasu, Shiga, Japan

Akinori Ebe

EMD Corp, Yasu, Shiga, Japan

Kenji Ishikawa

Center for Low-Temperature Plasma Sciences, Nagoya University, Nagoya, Aichi, Japan

Osamu Oda

Center for Low-Temperature Plasma Sciences, Nagoya University, Nagoya, Aichi, Japan

Masaru Hori

Center for Low-Temperature Plasma Sciences, Nagoya University, Nagoya, Aichi, Japan