Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication

Chen Hu; Songlin Wan; Guochang Jiang; Haojin Gu; Yibin Zhang; Yunxia Jin; Shijie Liu; Chengqiang Zhao; Hongchao Cao; Chaoyang Wei; Jianda Shao

doi:10.1017/hpl.2023.81

High Power Laser Science and Engineering (Jan 2024)

Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication

Chen Hu,
Songlin Wan,
Guochang Jiang,
Haojin Gu,
Yibin Zhang,
Yunxia Jin,
Shijie Liu,
Chengqiang Zhao,
Hongchao Cao,
Chaoyang Wei,
Jianda Shao

Affiliations

Chen Hu: ORCiD; Precision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, China
Songlin Wan: Precision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China
Guochang Jiang: Precision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China
Haojin Gu: Precision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China
Yibin Zhang: Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China
Yunxia Jin: ORCiD; Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China
Shijie Liu: Precision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, China China-Russian Belt and Road Joint Laboratory on Laser Science, Shanghai, China
Chengqiang Zhao: Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China
Hongchao Cao: Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China
Chaoyang Wei: Precision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, China
Jianda Shao: Precision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, China Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, China China-Russian Belt and Road Joint Laboratory on Laser Science, Shanghai, China

DOI: https://doi.org/10.1017/hpl.2023.81
Journal volume & issue: Vol. 12

Abstract

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The large-aperture pulse compression grating (PCG) is a critical component in generating an ultra-high-intensity, ultra-short-pulse laser; however, the size of the PCG manufactured by transmission holographic exposure is limited to large-scale high-quality materials. The reflective method is a potential way for solving the size limitation, but there is still no successful precedent due to the lack of scientific specifications and advanced processing technology of exposure mirrors. In this paper, an analytical model is developed to clarify the specifications of components, and advanced processing technology is adopted to control the spatial frequency errors. Hereafter, we have successfully fabricated a multilayer dielectric grating of 200 mm × 150 mm by using an off-axis reflective exposure system with Φ300 mm. This demonstration proves that PCGs can be manufactured by using the reflection holographic exposure method and shows the potential for manufacturing the meter-level gratings used in 100 petawatt class high-power lasers.

Published in High Power Laser Science and Engineering

ISSN: 2095-4719 (Print); 2052-3289 (Online)
Publisher: Cambridge University Press
Country of publisher: United Kingdom
LCC subjects: Technology: Engineering (General). Civil engineering (General): Applied optics. Photonics
Website: https://www.cambridge.org/core/journals/high-power-laser-science-and-engineering

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