Fractal Nanotechnology

Abstract

Abstract Self-similar patterns are frequently observed in Nature. Their reproduction is possible on a length scale 102–105 nm with lithographic methods, but seems impossible on the nanometer length scale. It is shown that this goal may be achieved via a multiplicative variant of the multi-spacer patterning technology, in this way permitting the controlled preparation of fractal surfaces.

Keywords

• Spacer technology
• Nanofabrication
• Crossbar structure
• Sub-lithographic preparation
• Fractals