Nature Communications (Nov 2017)

Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker

  • Chungryong Choi,
  • Jichoel Park,
  • Kanniyambatti L. Vincent Joseph,
  • Jaeyong Lee,
  • Seonghyeon Ahn,
  • Jongheon Kwak,
  • Kyu Seong Lee,
  • Jin Kon Kim

DOI
https://doi.org/10.1038/s41467-017-02019-9
Journal volume & issue
Vol. 8, no. 1
pp. 1 – 8

Abstract

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Block copolymers that form nanodomains and are used in nanolithography usually do not form nanopatterns with multiple shapes. Here the authors report a block copolymer that allows for UV- induced cleavage of one arm and demonstrate the transformation of the cylindrical to the lamellar nanodomain.