Advanced Electronic Materials (Aug 2024)

n‐Type GaSe Thin Flake for Field Effect Transistor, Photodetector, and Optoelectronic Memory

  • Arun Kumar,
  • Aniello Pelella,
  • Kimberly Intonti,
  • Loredana Viscardi,
  • Ofelia Durante,
  • Filippo Giubileo,
  • Paola Romano,
  • Hazel Neill,
  • Vilas Patil,
  • Lida Ansari,
  • Paul K. Hurley,
  • Farzan Gity,
  • Antonio Di Bartolomeo

DOI
https://doi.org/10.1002/aelm.202400010
Journal volume & issue
Vol. 10, no. 8
pp. n/a – n/a

Abstract

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Abstract The family of 2D chalcogenide semiconductors has been growing rapidly. Metal monochalcogenides, for instance, can enable new possibilities in functional electronics and optoelectronics. A Gallium Selenide (GaSe) thin flake is used to fabricate a back gated field effect transistor (FET) with n‐type conduction behavior and wide hysteresis at the ambient conditions. The device shows high mobility up to 28 cm2 V−1 s−1 with Ion/Ioff ratio over 103. Under the laser exposure, the device shows a decrease in the threshold voltage and a left‐shift of the transfer characteristic with a slight increase in the current. The transfer characteristic exhibits a hysteretic behavior with hysteresis width linearly dependent on the applied gate voltage. Moreover, the GaSe‐based FET shows a photo response with a photoresponsivity of 475 mAW−1 and detectivity of 4.6 × 1012 Jones. The photocurrent rise and decay times are 0.1 and 1.3 s, respectively. Furthermore, the GaSe FET device can be used as a performant memory device with well separated states and memory window enhanced by the laser exposure, confirming an optoelectronic memory class.

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