Apparatus and methods for measuring of the film structures homogeneity degree

Abstract

The designer-technological analysis of ellipsometric parameters measuring and calculation of the film refraction index and thickness scheme is conducted in this article. The flow-chart is developed and the model of apparatus for the film refraction index and thickness measuring and control of the film structures technology making is created. Package of automated programs of the film refraction index and thicknes calculating on the measured ellipsometric parameters, based on the iteration method of decision of ellipsometry equation was developed. The approbation of device, which showed the checking feature of films homogeneity both on an area and on a thickness on the example of determination of CdTe and HfO2 films refraction index and thickness is conducted.

Keywords

• ellipsometry
• methods of measuring the film parameters
• homogeneity control