MATEC Web of Conferences (Jan 2016)

Review of wide band-gap semiconductors technology

  • Jin Haiwei,
  • Qin Li,
  • Zhang Lan,
  • Zeng Xinlin,
  • Yang Rui

DOI
https://doi.org/10.1051/matecconf/20164001006
Journal volume & issue
Vol. 40
p. 01006

Abstract

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Silicon carbide (SiC) and gallium nitride (GaN) are typical representative of the wide band-gap semiconductor material, which is also known as third-generation semiconductor materials. Compared with the conventional semiconductor silicon (Si) or gallium arsenide (GaAs), wide band-gap semiconductor has the wide band gap, high saturated drift velocity, high critical breakdown field and other advantages; it is a highly desirable semiconductor material applied under the case of high-power, high-temperature, high-frequency, anti-radiation environment. These advantages of wide band-gap devices make them a hot spot of semiconductor technology research in various countries. This article describes the research agenda of United States and European in this area, focusing on the recent developments of the wide band-gap technology in the US and Europe, summed up the facing challenge of the wide band-gap technology.