Development of nanometer-thick graphite film extreme ultraviolet pellicle with hydrogen-resistant TiN capping layer

Abstract

TiN has beneficial physicochemical properties, such as high hardness, good chemical inertness, and good corrosion resistance. TiN has been used for optical filters and protective coatings to exploit these properties. We deposited TiN using atomic layer deposition as a capping layer for a pellicle. We investigated the hydrogen plasma resistance using Raman spectroscopy, transmission electron microscopy, atomic force microscopy, and x-ray photoelectron spectroscopy. As the hydrogen plasma exposure time increased, bonds formed between the TiN film and nitrogen compounds. With long-term exposure, the thickness of the TiN film decreased owing to etching.

Keywords

• EUV pellicle
• nanometer-thick graphite film
• titanium nitride
• hydrogen resistance