Sensors (Nov 2023)
Automotive 2.1 μm Full-Depth Deep Trench Isolation CMOS Image Sensor with a 120 dB Single-Exposure Dynamic Range
- Dongsuk Yoo,
- Youngtae Jang,
- Youngchan Kim,
- Jihun Shin,
- Kangsun Lee,
- Seok-Yong Park,
- Seungho Shin,
- Hongsuk Lee,
- Seojoo Kim,
- Joongseok Park,
- Cheonho Park,
- Moosup Lim,
- Hyungjin Bae,
- Soeun Park,
- Minwook Jung,
- Sungkwan Kim,
- Shinyeol Choi,
- Sejun Kim,
- Jinkyeong Heo,
- Hojoon Lee,
- KyungChoon Lee,
- Youngkyun Jeong,
- Youngsun Oh,
- Min-Sun Keel,
- Bumsuk Kim,
- Haechang Lee,
- JungChak Ahn
Affiliations
- Dongsuk Yoo
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Youngtae Jang
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Youngchan Kim
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Jihun Shin
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Kangsun Lee
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Seok-Yong Park
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Seungho Shin
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Hongsuk Lee
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Seojoo Kim
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Joongseok Park
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Cheonho Park
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Moosup Lim
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Hyungjin Bae
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Soeun Park
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Minwook Jung
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Sungkwan Kim
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Shinyeol Choi
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Sejun Kim
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Jinkyeong Heo
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Hojoon Lee
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- KyungChoon Lee
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Youngkyun Jeong
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Youngsun Oh
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Min-Sun Keel
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Bumsuk Kim
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- Haechang Lee
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- JungChak Ahn
- Samsung Electronics Co., Ltd., Yongin-si 17113, Republic of Korea
- DOI
- https://doi.org/10.3390/s23229150
- Journal volume & issue
-
Vol. 23,
no. 22
p. 9150
Abstract
An automotive 2.1 μm CMOS image sensor has been developed with a full-depth deep trench isolation and an advanced readout circuit technology. To achieve a high dynamic range, we employ a sub-pixel structure featuring a high conversion gain of a large photodiode and a lateral overflow of a small photodiode connected to an in-pixel storage capacitor. With the sensitivity ratio of 10, the expanded dynamic range could reach 120 dB at 85 °C by realizing a low random noise of 0.83 e- and a high overflow capacity of 210 ke-. An over 25 dB signal-to-noise ratio is achieved during HDR image synthesis by increasing the full-well capacity of the small photodiode up to 10,000 e- and suppressing the floating diffusion leakage current at 105 °C.
Keywords