C-V and J-V investigation of HfO2/Al2O3 bilayer dielectrics MOSCAPs on (100) β-Ga2O3
Hang Dong,
Wenxiang Mu,
Yuan Hu,
Qiming He,
Bo Fu,
Huiwen Xue,
Yuan Qin,
Guangzhong Jian,
Ying Zhang,
Shibing Long,
Zhitai Jia,
Hangbing Lv,
Qi Liu,
Xutang Tao,
Ming Liu
Affiliations
Hang Dong
Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China
Wenxiang Mu
State Key Laboratory of Crystal Materials, Key Laboratory of Functional Crystal Materials and Device, Shandong University, Jinan 250100, China
Yuan Hu
Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China
Qiming He
Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China
Bo Fu
State Key Laboratory of Crystal Materials, Key Laboratory of Functional Crystal Materials and Device, Shandong University, Jinan 250100, China
Huiwen Xue
Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China
Yuan Qin
Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China
Guangzhong Jian
Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China
Ying Zhang
Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China
Shibing Long
Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China
Zhitai Jia
State Key Laboratory of Crystal Materials, Key Laboratory of Functional Crystal Materials and Device, Shandong University, Jinan 250100, China
Hangbing Lv
Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China
Qi Liu
Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China
Xutang Tao
State Key Laboratory of Crystal Materials, Key Laboratory of Functional Crystal Materials and Device, Shandong University, Jinan 250100, China
Ming Liu
Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China
In this letter, MOS capacitors with bilayer dielectrics consisted of large bandgap Al2O3 and high-k HfO2 in different stacking order on n-type doped (100) β-Ga2O3 are investigated through C − V and J − V measurement. The C − V measurement results reveal that incoming HfO2 makes both bilayer structures attain an increasing dielectric constant, which means a better gate control ability in transistors comparing with single Al2O3. Additionally, the interface state density extracted by high-low frequency capacitance method suggests that Al2O3/(100)β-Ga2O3 with no treatment shows a comparative Dit value (8.0 × 1012 cm-2eV-1 to 2.2 × 1011 cm-2eV-1) with HfO2/(100)β-Ga2O3 (8.4 × 1012 cm-2eV-1 to 1.0 × 1011 cm-2eV-1) in energy range of 0.2 to 0.9 eV. Furthermore, HfO2/Al2O3/Ga2O3 showing a bigger forward breakdown voltage of 11.0 V than 7.8 V of Al2O3/HfO2/Ga2O3 demonstrates that inserted larger bandgap Al2O3 insulator between Ga2O3 semiconductor and high-k HfO2 dielectric can prevent gate leakage current more effectively. Accordingly, the HfO2/Al2O3/Ga2O3 can enhance gate control ability with an acceptable gate breakdown voltage and become an alternative choice in the design of the gate structure for Ga2O3 MOSFETs.
