Nanoscale Research Letters (Jan 2010)

The Characteristics of Seebeck Coefficient in Silicon Nanowires Manufactured by CMOS Compatible Process

  • Choi Sung-Jin,
  • Jang Moongyu,
  • Park Youngsam,
  • Jun Myungsim,
  • Hyun Younghoon,
  • Zyung Taehyoung

Journal volume & issue
Vol. 5, no. 10
pp. 1654 – 1657

Abstract

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Abstract Silicon nanowires are patterned down to 30 nm using complementary metal-oxide-semiconductor (CMOS) compatible process. The electrical conductivities of n-/p-leg nanowires are extracted with the variation of width. Using this structure, Seebeck coefficients are measured. The obtained maximum Seebeck coefficient values are 122 μV/K for p-leg and −94 μV/K for n-leg. The maximum attainable power factor is 0.74 mW/m K2 at room temperature.

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