AIP Advances (Oct 2013)

Diode behavior in ultra-thin low temperature ALD grown zinc-oxide on silicon

  • Nazek El-Atab,
  • Samar Alqatari,
  • Feyza B. Oruc,
  • Tewfic Souier,
  • Matteo Chiesa,
  • Ali K. Okyay,
  • Ammar Nayfeh

DOI
https://doi.org/10.1063/1.4826583
Journal volume & issue
Vol. 3, no. 10
pp. 102119 – 102119-7

Abstract

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A thin-film ZnO(n)/Si(p+) heterojunction diode is demonstrated. The thin film ZnO layer is deposited by Atomic Layer Deposition (ALD) at different temperatures on a p-type silicon substrate. Atomic force microscopy (AFM) AC-in-Air method in addition to conductive AFM (CAFM) were used for the characterization of ZnO layer and to measure the current-voltage characteristics. Forward and reverse bias n-p diode behavior with good rectification properties is achieved. The diode with ZnO grown at 80°C exhibited the highest on/off ratio with a turn-on voltage (VON) ∼3.5 V. The measured breakdown voltage (VBR) and electric field (EBR) for this diode are 5.4 V and 3.86 MV/cm, respectively.