Advanced Electronic Materials (Mar 2023)

Current Boosting of Self‐Aligned Top‐Gate Amorphous InGaZnO Thin‐Film Transistors under Driving Conditions

  • Jingyu Park,
  • Sungju Choi,
  • Changwook Kim,
  • Hong Jae Shin,
  • Yun Sik Jeong,
  • Jong Uk Bae,
  • Chang Ho Oh,
  • Saeroonter Oh,
  • Dae Hwan Kim

DOI
https://doi.org/10.1002/aelm.202201109
Journal volume & issue
Vol. 9, no. 3
pp. n/a – n/a

Abstract

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Abstract Oxide semiconductor transistors control the brightness and color of organic light‐emitting diode (OLED) displays in large‐screen televisions to portable telecommunications devices. Oxide semiconductor thin‐film transistors under driving conditions are required to maintain a steady current through the OLED for constant illuminance. Interestingly, for driving conditions under strong saturation where both gate and drain bias are high, a boosting phenomenon of the drain current is discovered, even with compensation of the threshold voltage. In this paper, the current boosting effect of self‐aligned InGaZnO transistors under driving conditions is comprehensively investigated. Based on experimental extraction methods, two distinct regions within the device are identified: an electron‐capture‐dominant region including electron trapping in the gate insulator and O–O dimer bond‐breaking, and an electron‐emission‐dominant region caused by peroxide formation. A dual‐transistor‐in‐series model is proposed, where each region is modeled as a local transistor. The current boosting phenomena as a function of time are well‐reproduced for various channel length devices, which validate the accuracy of the model. Better understanding of the underlying mechanisms enables increased effectiveness of compensation schemes for transistors under long‐term current‐driving conditions.

Keywords