Properties of atmospheric pressure plasma oxidized layers on silicon wafers

• Skácelová Dana,
• Sládek Petr,
• Sťahel Pavel,
• Pawera Lukáš,
• Haničinec Martin,
• Meichsner Jürgen,
• Černák Mirko

Affiliations

Skácelová Dana

Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic

Sládek Petr

Department of Physics, Faculty of Education, Masaryk University, Poříčí 7, 603 00, Brno, Czech Republic

Sťahel Pavel

Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic

Pawera Lukáš

Department of Physics, Faculty of Education, Masaryk University, Poříčí 7, 603 00, Brno, Czech Republic

Haničinec Martin

Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic

Meichsner Jürgen

Institute of Physics, University of Greifswald, Felix-Hausdorff-Strasse 6, 17487, Greifswald, Germany

Černák Mirko

Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic